The new energy and semiconductor industries have extremely high requirements for ultrapure water quality. Can this system stably meet the standards required for production?

Absolutely possible. The system adopts a dual stage RO+EDI+polishing mixed bed modular design, combined with stable current and pressure control technology, which can effectively remove various salts and impurities in water, and the stable water resistivity reaches 18.25M Ω .cm@25 The temperature, particulate matter, bacteria, TOC and other indicators meet the strict requirements for the production of semiconductors and new energy materials. The support of the GE EDI system in the United States ensures the continuous and stable production of high-purity water without the need for salt addition, and the constant pressure of the terminal effluent ensures long-term stable water quality without fluctuations.